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Planar Copper TargetPlanar copper target is a flat, disc-shaped or rectangular sputtering targets used in physical vapor deposition (PVD) processes to deposit thin copper films onto substrates, and it can stably releaseread more
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Rotary Copper TargetRotary copper target, also known as a rotatable or cylindrical sputtering target, is used in certain types of sputtering systems, such as magnetron sputtering, to enhance the uniformity andread more
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